ATOMIC LAYER DEPOSITION FILM FORMATION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an atomic layer deposition film formation apparatus capable of recovering effectively and reusing a precursor unused for film formation and discharged from a reaction chamber (2), and thereby reducing film formation cost.SOLUTION: A raw material gas exhaust path (26) connected to a reaction chamber (2) is disposed separately from a reaction gas exhaust path (28) and a purge gas exhaust path (30), and precursor collection means (36) is disposed on the raw material gas exhaust path (26).