发明名称 CHROMATIC ABERRATION-MEASURING SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To provide a chromatic aberration-measuring system capable of measuring an aberration at an imaging distance shorter than a measuring distance to an aberration measuring chart from an imaging device.SOLUTION: A chromatic aberration-measuring system Sincludes a reflection plate 10, and includes chart regions C each arranging an aberration measuring chart P and reflection regions R having an opening H, on a same plane. The chromatic aberration-measuring system Sis provided with: chart plates 20B arranged while facing surfaces of the chart regions C, with respect to the surfaces of the reflection plates 10, respectively; and a chromatic aberration-measuring device 40 for measuring a chromatic aberration from an image captured by an imaging device 30 through the opening H. The chart plate 20B provides the chart region C at a position separated by a prescribed interval from a center of the opening H, and further provides the reflection region R between the opening H and the chart region C.</p>
申请公布号 JP2015152528(A) 申请公布日期 2015.08.24
申请号 JP20140028722 申请日期 2014.02.18
申请人 NIPPON HOSO KYOKAI <NHK> 发明人 NAKAMURA TOMOHIRO;YAMASHITA TAKAYUKI;HAYASHIDA TETSUYA;FUNATSU RYOHEI;SOENO TAKUJI
分类号 G01M11/02;G01M11/00;H04N9/04;H04N17/00 主分类号 G01M11/02
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