CLEANING GAS CIRCULATING APPARATUS, CHEMICAL VAPOR DEPOSITION EQUIPMENT AND ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION EQUIPMENT

摘要

The present invention relates to a cleaning gas circulating device, a deposition device, and an atmospheric pressure chemical vapor deposition device, capable of equally supplying cleaning gas into a chamber. The device includes a cleaning gas supply pipe installed at a cleaning gas inlet formed in a part of a chamber of the deposition device, and supplying the cleaning gas into the chamber; a cleaning gas discharge pipe installed at a cleaning gas outlet formed in the other part of the chamber, and discharging the cleaning gas from the chamber; a cleaning gas circulation pipe connecting the cleaning gas supply pipe with the cleaning gas discharge pipe; and a cleaning gas purifying filter installed on the cleaning gas circulation pipe, and purifying the cleaning gas. The cleaning gas inlet is installed around one among first, second, third, and fourth corners of an upper part of the chamber in order to elongate a movement path of the cleaning gas in the chamber, and the cleaning gas outlet is installed around a corner, placed in the opposite side to the corner in a 3D diagonal direction, among fifth, sixth, seventh, and eighth corners of a lower part of the chamber.