| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing apparatus which is advantageous in maintenance on a shield member provided in a vacuum container.SOLUTION: A processing apparatus includes: a vacuum container; a supply source which supplies a substance to a substrate; a first shield 402 which includes a first supply source and a second supply source arranged opposite to a first surface of the substrate conveyed into the vacuum container and a second surface on the opposite side from the first surface respectively, and is provided at a periphery of the first supply source; a shield member which includes a second shield 404 provided at a periphery of the second supply source, and is arranged such that the substrate is sandwiched between the first shield and second shield; and a moving device which moves the first shield and second shield so that the first shield and second shield are in a proximity state or in a separation state. In the proximity state, process spaces are formed between the first supply source and the substrate and between the second supply source and the substrate respectively, and the first surface and second surface are processed respectively. |
