| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that has high developability, gives a cured product having excellent elasticity recovery property and adhesiveness, and allows formation of a high-definition spacer.SOLUTION: The photosensitive resin composition comprises: a polyfunctional (meth)acrylate (A) containing a polyfunctional (meth)acrylate (A1) having a hydrophile-lipophile balance of 8 or more and 30 or less by 50 to 100 wt.%; and a photopolymerization initiator (B). It is preferable that (A1) has an oxyalkylene group. It is preferable that the composition further contains a silane compound having two or more hydrolyzable alkoxy groups, a hydrophilic binder resin (D), a solvent (E), or the like. |
