| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device capable of obtaining a desired fine pattern with a smaller number of steps than an LELE process.SOLUTION: There is provided a method for manufacturing a semiconductor device which comprises: a coating step of coating a photosensitive agent on a workpiece; a first exposure step of exposing the photosensitive agent using a first exposure mask; a first development step of performing positive development using a first developer in the photosensitive agent after the first exposure step; a second exposure step of exposing the photosensitive agent using a second exposure mask after the first development step; and a second development step of performing negative development using a second developer in the photosensitive agent after the second exposure step. |
