CLEANING METHOD AND CLEANING APPARATUS OF CLEANED SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method and a cleaning apparatus capable of generating OH radicals with high efficiency, while exhibiting high cleaning effect, at a low cost in the operational aspect.SOLUTION: In a cleaning method for cleaning a cleaned substrate by supplying a cleaning solution from the discharge port of a cleaning solution supply mechanism onto the cleaned substrate while holding, piping resistance is applied to the cleaning solution in the cleaning solution supply mechanism. Furthermore, a light source emitting UV rays is brought into contact with the cleaning solution to irradiate the cleaning solution with the UV rays while heating the same. Consequently, OH radicals of active species are generated in the cleaning solution, and the cleaned substrate is cleaned by supplying the cleaning solution containing the OH radicals.