发明名称 RESIN COMPOSITION CONTAINING POLYIMIDE PRECURSOR, CURED FILM AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a resin composition excellent in photocurability on a substrate having a copper wiring and from which a cured film has low stress.SOLUTION: There is provided a resin composition containing following (a) component, (b) component and (c) component: (a) a polyimide precursor having a structural unit represented by the following formula (1), where Ris a tetravalent organic group, Ris a bivalent organic group, Rand Rare each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms or a monovalent organic group having a carbon-carbon unsaturated double bond; (b) a photopolymerizable compound having an ethylenically unsaturated bond; (c) a triaryl imidazole dimer, a phosphine oxide compound or an alkylphenone compound.
申请公布号 JP2015151404(A) 申请公布日期 2015.08.24
申请号 JP20140023520 申请日期 2014.02.10
申请人 HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD 发明人 ONO TAKASHI;ENOMOTO TETSUYA;OE TADAYUKI;SUZUKI KEIKO;SOEJIMA KAZUYA;SUZUKI ETSUHARU
分类号 C08L79/08;C08K5/07;C08K5/3445;C08K5/5397;C09D4/00;C09D7/12;C09D179/08;G03F7/027;G03F7/029;G03F7/031;H01L21/027 主分类号 C08L79/08
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