| 摘要 |
PROBLEM TO BE SOLVED: To improve fidelity during transfer of a mask pattern.SOLUTION: A work conversion difference compensation part 11a corrects a mask pattern H based on work conversion difference between a resist pattern R to which the mask pattern H is transferred, and a pattern T after being subjected to work. A first auxiliary pattern arrangement part 11b arranges a first auxiliary pattern on a corner of the mask pattern H, and a second auxiliary pattern arrangement part 11c calculates an arrangement position of the second auxiliary pattern based on an aperture angle of the resist pattern R, and arranges the second auxiliary pattern on the arrangement position. |
