| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate processing device capable of reducing oxygen concentration in an atmosphere in contact with a substrate to process the substrate in a low oxygen concentration atmosphere.SOLUTION: A substrate processing device includes: a spin chuck 8 which rotates a substrate W; a blocking member 31 arranged above the substrate W; a cup 22 surrounding a spin base 10; an upper gas valve 58 which discharges an inert gas from a downward discharge port 34 of the blocking member 31; and an exhaust duct which discharges the gas in the cup 22. The blocking member 31 includes a facing surface 35 arranged above the substrate W and an inner peripheral surface 36 surrounding the substrate W. A lower end of the inner peripheral surface 36 of the blocking member 31 is arranged around the spin base 10. A distance D2 in a radial direction from the lower end of the inner peripheral surface 36 of the blocking member 31 to an outer peripheral surface of the spin base 10 is not less than a distance D1 in a vertical direction from an upper surface of the substrate W to the facing surface 35 of the blocking member 31.</p> |
