发明名称 |
METHODE FOR MANUFACTURING MASTER MOLD, MASTER MOLD MANUFACTURED BY THE METHODE, METHODE FOR MANUFACTURING TRANSPARENT PHOTOMASK, TRANSPARENT PHOTOMASK MANUFACTURED BY THE METHODE AND METHODE FOR MANUFACTURING CONDUCTIVE MESH PATTERN USING THE TRANSPARENT PHOTOMASK |
摘要 |
The present invention relates to a method for manufacturing a master mold and a master mold manufactured thereby, a method for manufacturing a transparent photomask and a transparent photomask manufactured thereby, and a method for manufacturing a conductive mesh pattern using the transparent photomask. The method includes the steps of: a) forming a first photosensitive material layer; b) forming a first photosensitive material pattern layer; c) forming a second photosensitive material layer; d) forming a second photosensitive material pattern layer; e) etching parts where the first photosensitive material pattern layer and the second photo sensitive material pattern layers are not formed; and f) manufacturing a mesh pattern. |
申请公布号 |
KR20150095595(A) |
申请公布日期 |
2015.08.21 |
申请号 |
KR20150022431 |
申请日期 |
2015.02.13 |
申请人 |
LG CHEM. LTD. |
发明人 |
PARK, JEONG HO;JUNG, JIN MI;JEONG, YU JIN;SHIN, BU GON |
分类号 |
G06F3/041;G03F7/26 |
主分类号 |
G06F3/041 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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