| 摘要 |
The purpose of the present invention is to provide a composition for forming a pattern capable of forming a sufficiently fine pattern while maintaining a phase separation time and a coating property. The composition for forming a pattern contains: a block copolymer which has a first block including a first repeating unit including a silicon atom and a second block including a second repeating unit not including a silicon atom, and forms a phase separation structure by self-organization; and a solvent. The first repeating unit includes two or more silicon atoms and also, has the total atomic weight of less than or equal to 700. Preferable as the second block is either a polystyrene block including an unsubstituted or substituted styrene unit; or a poly(meth)acrylic acid block including a (meth)acrylic acid ester unit. |
