发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>The present invention provides a semiconductor device with favorable excess water tolerance. The present invention increases adhesion between a semiconductor chip (2) and an encapsulation resin (8) by forming an area (25) with large unevenness on the upper surface of the semiconductor chip (2) covered by the encapsulation resin (8) and an area (24) with small unevenness on the lower surface thereof, thereby preventing the penetration of moisture from the outside.</p>
申请公布号 KR20150095586(A) 申请公布日期 2015.08.21
申请号 KR20150020958 申请日期 2015.02.11
申请人 SEIKO INSTRU KABUSHIKI KAISHA, ALSO TRADING AS SEIKO INSTRUMENTS INC. 发明人 TAKESAWA MAKOTO
分类号 H01L23/538;H01L23/28 主分类号 H01L23/538
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