发明名称 PROCEDE AMELIORE DE FABRICATION DE COUCHES DE POLISSAGE MECANO-CHIMIQUE
摘要 <p>A method of making a polishing layer for polishing a substrate is provided, comprising: providing a liquid prepolymer material; providing a plurality of hollow microspheres; exposing the plurality of hollow microspheres to a vacuum to form a plurality of exposed hollow microspheres; treating the plurality of exposed hollow microspheres with a carbon dioxide atmosphere to form a plurality of treated hollow microspheres; combining the liquid prepolymer material with the plurality of treated hollow microspheres to form a curable mixture; allowing the curable mixture to undergo a reaction to form a cured material, wherein the reaction is allowed to begin≰24 hours after the formation of the plurality of treated hollow microspheres; and, deriving at least one polishing layer from the cured material; wherein the at least one polishing layer has a polishing surface adapted for polishing the substrate.</p>
申请公布号 FR3017558(A1) 申请公布日期 2015.08.21
申请号 FR20150051173 申请日期 2015.02.13
申请人 ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 发明人 KOLESAR DAVID;SARAFINAS AARON;SAIKIN ALAN;POST ROBERT L.
分类号 B24B1/00;B05D5/00;B05D7/02;H01L21/304;H01L21/3105 主分类号 B24B1/00
代理机构 代理人
主权项
地址