发明名称 |
PROCEDE AMELIORE DE FABRICATION DE COUCHES DE POLISSAGE MECANO-CHIMIQUE |
摘要 |
<p>A method of making a polishing layer for polishing a substrate is provided, comprising: providing a liquid prepolymer material; providing a plurality of hollow microspheres; exposing the plurality of hollow microspheres to a vacuum to form a plurality of exposed hollow microspheres; treating the plurality of exposed hollow microspheres with a carbon dioxide atmosphere to form a plurality of treated hollow microspheres; combining the liquid prepolymer material with the plurality of treated hollow microspheres to form a curable mixture; allowing the curable mixture to undergo a reaction to form a cured material, wherein the reaction is allowed to begin≰24 hours after the formation of the plurality of treated hollow microspheres; and, deriving at least one polishing layer from the cured material; wherein the at least one polishing layer has a polishing surface adapted for polishing the substrate.</p> |
申请公布号 |
FR3017558(A1) |
申请公布日期 |
2015.08.21 |
申请号 |
FR20150051173 |
申请日期 |
2015.02.13 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
发明人 |
KOLESAR DAVID;SARAFINAS AARON;SAIKIN ALAN;POST ROBERT L. |
分类号 |
B24B1/00;B05D5/00;B05D7/02;H01L21/304;H01L21/3105 |
主分类号 |
B24B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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