| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a transparent conductive support, or the like, by which an amount of removal waste by etching can be decreased and transparency can be maintained while suppressing glossiness of a metal layer without blackening-treated layer.SOLUTION: A catalyst film layer 10 containing a catalyst 5 is formed on a surface of a transparent support body 40; a thick resist layer 50 is formed on the catalyst film layer 10; the resist layer 50 is exposed and developed to form a groove 1 comprising a fine linear pattern where a part of the catalyst layer 10 is exposed; and a thick metal film layer 20 is formed by electroless plating or the like only on the catalyst layer 10 in the exposed groove 1. |
