DYNAMIC PATTERNING METHOD THAT REMOVES PHASE CONFLICTS AND IMPROVES PATTERN FIDELITY AND CDU ON A TWO PHASE-PIXELATED DIGITAL SCANNER

摘要

Phase conflicts in pattern transfer with phase masks can be resolve by exposing pattern features with a first pattern and a second pattern, wherein the second pattern is selected based on the phase conflicts. In scanned exposures using pulsed lasers, a number of exposures of the second pattern can be less than 20% of a total number of exposures.

主权项

1. An apparatus, comprising:
a digital phase mask comprising a plurality of independently assignable phase pixels; a pattern generator coupled to the digital phase mask so as to define at least a first phase pattern portion and a second phase pattern portion associated with a pattern feature, wherein the second phase pattern portion is associated with phase conflict in the first phase pattern portion; and an optical system situated to expose a sensitized substrate to the first and second phase pattern portions defined on the digital phase mask.