| 摘要 |
FIELD: instrumentation.SUBSTANCE: in the method according to the invention the reference distributions of intensity are obtained in several spectral intervals at various positions of the sample along the optical axis, the library of reference matrixes is formed; the studied sample is positioned, the sample is lighted with light with wide frequency spectrum corresponding to the visible range of wave lengths, the light scattered by the sample is collected; distributions of intensity of diffused light for several spectral intervals at various positions of the sample along the optical axis are obtained, the matrix of distributions of intensity for the studied sample is formed and the information on the size of critical development is obtained by comparison of the obtained matrix of distributions of intensity with the library of reference matrixes. The device contains the optical radiation source, lighting the optical system, the collecting optical system, the spectral selection unit, the image detector, the sample positioning device and the computing unit.EFFECT: invention provides more effective and accurate determination of the critical size at significantly smaller expenses.9 cl, 4 dwg |
