SUBSTRATE, AND MANUFACTURING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a substrate capable of easily achieving a high aspect ratio of a metal nanorod and precisely disposing the metal nanorod, and a manufacturing method thereof.SOLUTION: A substrate includes a porous self-supporting alumina film formed by anodic oxidation treatment of aluminum, and a plurality of metal nanorods filled in the at least front side of a plurality of pores of the porous self-supporting alumina film. The average aspect ratio of the plurality of metal nanorods is preferably 100 or more. The plurality of metal nanorods may protrude to the surface side of the porous self-supporting alumina film. A manufacturing method of the substrate includes a step for forming the porous alumina film on the surface of an aluminum plate by the anodic oxidation treatment, a step for separating the porous self-supporting alumina film from the aluminum plate, and a step for forming the plurality of metal nanorods filled in the at least front side of the plurality of pores of the porous self-supporting alumina film.