发明名称 X-RAY ANALYSIS METHOD, AND X-RAY ANALYSIS DEVICE
摘要 PROBLEM TO BE SOLVED: To easily and reliably obtain, with regard to a crystalline sample such as a chemical compound semiconductor device, a normal X-ray energy dependency spectrum unaffected by a disturbing diffraction line automatically without relying on manual labor, and obtain highly reliable high-accuracy information about a local structure.SOLUTION: There is provided an X-ray analysis method using an electron yield XAFS (X-ray Absorption Fine Structure) method, which, when irradiating a sample with an X-ray and obtaining the X-ray energy dependency of a current that flows due to electrons flying out of the sample or by ionization of a peripheral gas by the electrons, changes a direction of the sample relative to the irradiated X-ray and obtains the X-ray energy dependency (specifically, obtaining an X-ray energy dependency spectrum in at least three crystal orientations different from each other and determining that a spectrum in which two out of three kinds of spectrums thus obtained are the same is the normal spectrum, or obtaining the X-ray energy dependency spectrum while rotating and swinging the sample).
申请公布号 JP2015148443(A) 申请公布日期 2015.08.20
申请号 JP20140019699 申请日期 2014.02.04
申请人 FUJITSU LTD 发明人 NOMURA KENJI
分类号 G01N23/227;G01N23/06 主分类号 G01N23/227
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