MULTIPLE PATTERNING DESIGN WITH REDUCED COMPLEXITY

摘要

A three color map can be built based on an integrated circuit (IC) layout, each color representing an exposure in a multiple (here triple) patterning lithography process and can include any combination of additive and/or subtractive exposures. A series of design rules can start with color-specific rules before considering any combination of colors and/or exposures. If the map fails any rule, building the map can be repeated with adjustments and it can be assessed with the design rules.

主权项

1. A method, performed on a computing device having at least one processing unit in communication with at least one non-transitory computer readable storage medium, of preparing an integrated circuit (IC) layout design, the method comprising:
using the at least one processing unit of the computing device to:
receive a layout of the layout design with pattern features in the layout specified as discrete shapes;build a multiple color representation of the layout including a combination of a plurality of colors, each color representing a respective exposure, and each discrete shape of the layout including a subshape in at least one of the colors;determine whether the multiple color representation of the layout passes a plurality of design rules including at least a minimum space between facing parallel edges of adjacent shapes; andresponsive to failure under at least one design rule, adjust the layout and repeat the building of a multiple color representation and the determining whether the multiple color representation passes a plurality of design rules.