| 发明名称 |
WIRING STRUCTURE FOR TRENCH FUSE COMPONENT WITH METHODS OF FABRICATION |
| 摘要 |
The present disclosure generally relates to a wiring structure for a fuse component and corresponding methods of fabrication. A wiring structure for a fuse component according to the present disclosure can include: a first electrical terminal embedded within a doped conductive layer, the doped conductive layer being positioned between two insulator layers of an integrated circuit (IC) structure; a dielectric liner positioned between the first electrical terminal and the doped conductive layer; a second electrical terminal embedded within the doped conductive layer; wherein each of the first electrical terminal and the second electrical terminal are further embedded in one of the two insulator layers, and the dielectric liner is configured to degrade upon becoming electrically charged. |
| 申请公布号 |
US2015235945(A1) |
申请公布日期 |
2015.08.20 |
| 申请号 |
US201414184003 |
申请日期 |
2014.02.19 |
| 申请人 |
International Business Machines Corporation |
发明人 |
Kirihata Toshiaki;Maciejewski Edward P.;Iyer Subramanian S.;Pei Chengwen;Wehella-Gamage Deepal U. |
| 分类号 |
H01L23/525;H01L21/768 |
主分类号 |
H01L23/525 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A wiring structure for a trench fuse component, the wiring structure comprising:
a first electrical terminal embedded within a doped conductive layer, the doped conductive layer being positioned between two insulator layers of an integrated circuit (IC) structure; a dielectric liner positioned between the first electrical terminal and the doped conductive layer; a second electrical terminal embedded within the doped conductive layer; wherein each of the first electrical terminal and the second electrical terminal are further embedded in one of the two insulator layers, and the dielectric liner is configured to degrade upon becoming electrically charged. |
| 地址 |
Armonk NY US |
