发明名称 METHOD OF SELECTIVE RECOVERY OF VALUABLE METALS FROM MIXED METAL OXIDES
摘要 The present invention relates to a process for recovering metals from indium tin oxide (ITO) scrap. It allows the selective recovery of indium and tin from waste ITO by means of a simple and environmentally benign dissolution-deposition method, with no requirement of using strong corrosive acid/alkaline chemicals (e.g. hydrochloric acid, nitric acid, sulfuric acid and sodium hydroxide) for dissolution and complicated procedures/operation. The dissolution baths can be reused without observable recovery deterioration. It significantly reduces the cost requirement in the recovery process.
申请公布号 US2015233004(A1) 申请公布日期 2015.08.20
申请号 US201514601189 申请日期 2015.01.20
申请人 Nano and Advanced Materials Institute Limited 发明人 HO Kam Piu;HO Kwok Keung Paul;WANG Ranshi;ZHENG Fulin
分类号 C25C1/14;C25C7/02;C25C1/22 主分类号 C25C1/14
代理机构 代理人
主权项 1. A method for sequentially recovering indium and tin from ITO-containing waste comprising: a) reducing the size of ITO-containing materials by shredding and crushing so as to form finely-divided particles; b) subjecting the finely-divided particles to chemical and physical cleaning for pre-treatment to substantially avoid the interference in dissolution step; c) transferring the pre-treated particles to a first dissolution bath comprising a first bath formulation at a bath temperature ranging from 60° C. to 120° C. with continuous stirring for 30-180 minutes to dissolve the pre-treated particles; d) adding 50-300% by volume of water into the solution containing the dissolved particles from step (c) to form a first mixture and filtering the first mixture so as to collect an indium-rich filtrate and a tin-rich filtrand; e) putting an indium plate in the indium-rich filtrate for 1-10 hours to remove the tin residue by a displacement reaction; f) recovering indium with purity not less than 99.9% from the indium-rich filtrate by a first deposition process; g) reusing the dissolution bath in step (c) for the next recovery cycle after water evaporation.
地址 Hong Kong HK