发明名称 |
METHOD OF SELECTIVE RECOVERY OF VALUABLE METALS FROM MIXED METAL OXIDES |
摘要 |
The present invention relates to a process for recovering metals from indium tin oxide (ITO) scrap. It allows the selective recovery of indium and tin from waste ITO by means of a simple and environmentally benign dissolution-deposition method, with no requirement of using strong corrosive acid/alkaline chemicals (e.g. hydrochloric acid, nitric acid, sulfuric acid and sodium hydroxide) for dissolution and complicated procedures/operation. The dissolution baths can be reused without observable recovery deterioration. It significantly reduces the cost requirement in the recovery process. |
申请公布号 |
US2015233004(A1) |
申请公布日期 |
2015.08.20 |
申请号 |
US201514601189 |
申请日期 |
2015.01.20 |
申请人 |
Nano and Advanced Materials Institute Limited |
发明人 |
HO Kam Piu;HO Kwok Keung Paul;WANG Ranshi;ZHENG Fulin |
分类号 |
C25C1/14;C25C7/02;C25C1/22 |
主分类号 |
C25C1/14 |
代理机构 |
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代理人 |
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主权项 |
1. A method for sequentially recovering indium and tin from ITO-containing waste comprising:
a) reducing the size of ITO-containing materials by shredding and crushing so as to form finely-divided particles; b) subjecting the finely-divided particles to chemical and physical cleaning for pre-treatment to substantially avoid the interference in dissolution step; c) transferring the pre-treated particles to a first dissolution bath comprising a first bath formulation at a bath temperature ranging from 60° C. to 120° C. with continuous stirring for 30-180 minutes to dissolve the pre-treated particles; d) adding 50-300% by volume of water into the solution containing the dissolved particles from step (c) to form a first mixture and filtering the first mixture so as to collect an indium-rich filtrate and a tin-rich filtrand; e) putting an indium plate in the indium-rich filtrate for 1-10 hours to remove the tin residue by a displacement reaction; f) recovering indium with purity not less than 99.9% from the indium-rich filtrate by a first deposition process; g) reusing the dissolution bath in step (c) for the next recovery cycle after water evaporation. |
地址 |
Hong Kong HK |