发明名称 PLASMA SOURCE, ION SOURCE AND METHOD OF ION GENERATION
摘要 PROBLEM TO BE SOLVED: To provide a metal plasma source high in ionization probability and thereby capable of generating plasma with a high ionic current, in order to produce a large amount of endohedral fullerenes.SOLUTION: When, for example, Li is used as atoms to be included, Li is charged in a metal sublimation oven 5, a heating wire 7 is heated to generate a Li vapor, and the Li vapor is jetted against a heated metal body 4 through a nozzle-shaped metal vapor introduction pipe 6. Simultaneously at this time, the heated metal body 4 is irradiated with light from a light source 9. For example, a ruby laser light source having a wavelength of 694 nm is used as the light source. Light having a wavelength of 694 nm imparts an energy of 1.79 eV to electrons in a Li atom, so that the electrons are excited and easily transferred to a state energy of a vacancy of the heated metal body. Accordingly, ionization probability can be enhanced.
申请公布号 JP2015149279(A) 申请公布日期 2015.08.20
申请号 JP20150015930 申请日期 2015.01.29
申请人 KANEKO HIROYUKI 发明人 KASAMA YASUHIKO;OMOTE KENJI;YOKOO KUNIYOSHI
分类号 H05H1/24;B82Y40/00;C01B31/02;H01J27/24;H01J27/26;H01J37/08 主分类号 H05H1/24
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