发明名称 |
Charged Particle Microscope System and Measurement Method Using Same |
摘要 |
A charged particle microscope system with a charged particle microscope including an irradiation unit that irradiates a subject to be inspected with a charged particle beam and a detection unit having a detector that detects a charged particle signal from the subject to be inspected irradiated by the irradiation unit; a signal processing unit that converts the charged particle signal detected by the detector of the charged particle microscope into an image signal; and an arithmetic processing unit that corrects the image signal converted by the signal processing unit with the use of signal conversion characteristics. |
申请公布号 |
US2015235804(A1) |
申请公布日期 |
2015.08.20 |
申请号 |
US201314421163 |
申请日期 |
2013.08.07 |
申请人 |
Hitachi High-Technologies Corporation |
发明人 |
Osaki Mayuka;Kimura Maki;Shishido Chie;Sasada Katsuhiro |
分类号 |
H01J37/22;G02B21/00;G06T5/00 |
主分类号 |
H01J37/22 |
代理机构 |
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代理人 |
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主权项 |
1. A charged particle microscope system, comprising:
a charged particle microscope including an irradiation unit that irradiates a subject to be inspected with a charged particle beam and a detection unit having a detector that detects a charged particle signal from the subject to be inspected irradiated by the irradiation unit; a signal processing unit that converts the charged particle signal detected by the detector of the charged particle microscope into an image signal; and an arithmetic processing unit that corrects the image signal converted by the signal processing unit with the use of signal conversion characteristics. |
地址 |
Minato-ku, Tokyo JP |