EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus includes a projection system having a final optical element via which an exposure beam is projected, an immersion member having an opening through which the exposure beam is projected, liquid supply ports and liquid recovery ports, a stage which is movable below and relative to the projection system and the immersion member, the stage including a holder configured to hold a substrate, and a detection system configured to detect a residual liquid on at least one of the substrate held on the holder of the movable stage and the movable stage. A liquid immersion area that covers only a portion of the upper surface of the substrate is formed on an upper surface of the substrate held on the holder of the movable stage, while supplying immersion liquid via the liquid supply ports and removing the immersion liquid via the liquid recovery ports.

主权项

1. An exposure apparatus comprising:
a projection system having a final optical element via which an exposure beam is projected; an immersion member having (i) an opening through which the exposure beam is projected, (ii) liquid supply ports and (iii) liquid recovery ports; a stage which is movable below and relative to the projection system and the immersion member, the stage including a holder configured to hold a substrate; and a detection system configured to detect a residual liquid on at least one of the substrate held on the holder of the stage and the stage, wherein:
a liquid immersion area is formed on an upper surface of the substrate held on the holder of the stage, while supplying immersion liquid via the liquid supply ports facing the upper surface of the substrate and removing the immersion liquid via the liquid recovery ports,the liquid immersion area is formed such that only a portion of the upper surface of the substrate is covered by the immersion liquid, andthe substrate is exposed with the exposure beam through the immersion liquid in the liquid immersion area.