| 发明名称 |
SYNTHESIZING LOW MASK ERROR ENHANCEMENT FACTOR LITHOGRAPHY SOLUTIONS |
| 摘要 |
In one embodiment, a source mask optimization (SMO) method is provided that includes controlling bright region efficiency during at least one optical domain step. The bright region efficiency being the proportion of the total transmitted light that is transferred to bright areas of a target pattern. The optical domain intermediate solution provided by the at least one optical domain step may then be binarized to obtain an initial spatial domain solution with a controlled MEEF (Mask Error Enhancement Factor). The MEEF is controlled during at least one spatial domain step that optimizes the initial spatial domain solution. |
| 申请公布号 |
US2015234970(A1) |
申请公布日期 |
2015.08.20 |
| 申请号 |
US201414185506 |
申请日期 |
2014.02.20 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
Inoue Tadanobu;Melville David O.;Rosenbluth Alan E.;Sakamoto Masaharu;Tian Kehan |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A source mask optimization (SMO) method comprising:
controlling bright region efficiency during at least one optical domain step, the bright region efficiency being a proportion of a total transmitted light that is transferred to bright areas of a target pattern; binarizing an optical domain intermediate solution provided by the at least one optical domain step to obtain an initial spatial domain solution with a controlled MEEF (Mask Error Enhancement Factor); and controlling MEEF during at least one spatial domain step that optimizes the initial spatial domain solution. |
| 地址 |
Armonk NY US |
