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1. A photosensitive polysiloxane composition, comprising:
a polysiloxane (A); an o-naphthoquinonediazidesulfonate (B); a silane compound (C) containing an amic acid group; and a solvent (D), wherein the polysiloxane (A) is formed by polycondensing a compound represented by formula (1),
Si(R1)W(OR2)4-W formula (1), in formula (1), R1 each independently represents a hydrogen atom, an alkyl group of 1-10 carbon atoms, an alkenyl group of 2-10 carbon atoms, an aryl group of 6-15 carbon atoms, an alkyl group containing an anhydride group, an alkyl group containing an epoxy group or an alkoxy group containing an epoxy group; R2 each independently represents a hydrogen atom, an alkyl group of 1-6 carbon atoms, an acyl group of 1-6 carbon atoms or an aryl group of 6-15 carbon atoms; w represents an integer selected from 0, 1, 2 and 3; the silane compound (C) containing an amic acid group is represented by formula (2), in formula (2), R3 and R3′ each independently represents an alkyl group of 1-6 carbon atoms, a substituted alkyl group of 1-6 carbon atoms, an alkoxy group of 1-6 carbon atoms, a substituted alkoxy group of 1-6 carbon atoms, a phenyl group, a substituted phenyl group, a phenoxy group or a substituted phenoxy group; R4 and R4′ each independently represents a divalent organic group of 1-10 carbon atoms; R5 represents an organic group of 2-20 carbon atoms. |
