发明名称 PHASE CONTRAST IMAGE FORMATION, AND ADJUSTMENT OF TEM FOR PHASE CONTRAST IMAGE FORMATION
摘要 PROBLEM TO BE SOLVED: To provide a novel method for phase contrast image formation in a transmission electron microscopy.SOLUTION: In the method, an imaging electron beam itself is used to adjust a hole-free thin film for use as an actual phase plate, in some cases eliminating the need for ex-situ fabrication of a hole and reducing requirements for the precision of ZPP hardware. The electron optical properties of the ZPP hardware are modified primarily in two ways: by boring a hole using the electron beam; and/or by modifying the electro-optical properties by charging induced by the primary beam. Furthermore a method where a sample is focused by a lens downstream from the ZPP hardware is disclosed. A method for transferring a back focal plane of an objective lens to the aperture plane of a selected area and an optional plane conjugated with the back focal plane of the objective lens is also provided.
申请公布号 JP2015149303(A) 申请公布日期 2015.08.20
申请号 JP20150090742 申请日期 2015.04.27
申请人 JEOL LTD 发明人 MALAC MAREK;BELEGGIA MARCO;KAWASAKI MASAHIRO;EGERTON RAY
分类号 H01J37/26 主分类号 H01J37/26
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