发明名称 |
TEMPERATURE MEASUREMENT METHOD AND PLASMA TREATMENT SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To enable high-precision measurement of the temperature of a measurement target member disposed in a plasma treatment device through a measurement window.SOLUTION: A temperature measurement method for a measurement target member disposed in a chamber of a plasma treatment apparatus includes the steps of: acquiring a function f for correcting a correction target temperature Taccording to a temperature Tof a measurement window which is calculated from the correction target temperature Tas a temperature of the measurement target member measured through the measurement window secured to the chamber, a reference temperature Tas the temperature of the measurement target member measured not through the measurement window, and the measured temperature Tof the measurement window; measuring the correction target temperature T; measuring the temperature Tof the measurement window; and correcting the correction target temperature Taccording to the measured temperature Tof the measurement window on the basis of the acquired function f. |
申请公布号 |
JP2015149311(A) |
申请公布日期 |
2015.08.20 |
申请号 |
JP20140019634 |
申请日期 |
2014.02.04 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
YOSHIDA YUSUKE;SUN LIANG;SENDA TAKAHIRO;KONO MASAYUKI;MATSUMOTO NAOKI |
分类号 |
H01L21/3065;C23C16/52;H05H1/46 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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