发明名称 TEMPERATURE MEASUREMENT METHOD AND PLASMA TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To enable high-precision measurement of the temperature of a measurement target member disposed in a plasma treatment device through a measurement window.SOLUTION: A temperature measurement method for a measurement target member disposed in a chamber of a plasma treatment apparatus includes the steps of: acquiring a function f for correcting a correction target temperature Taccording to a temperature Tof a measurement window which is calculated from the correction target temperature Tas a temperature of the measurement target member measured through the measurement window secured to the chamber, a reference temperature Tas the temperature of the measurement target member measured not through the measurement window, and the measured temperature Tof the measurement window; measuring the correction target temperature T; measuring the temperature Tof the measurement window; and correcting the correction target temperature Taccording to the measured temperature Tof the measurement window on the basis of the acquired function f.
申请公布号 JP2015149311(A) 申请公布日期 2015.08.20
申请号 JP20140019634 申请日期 2014.02.04
申请人 TOKYO ELECTRON LTD 发明人 YOSHIDA YUSUKE;SUN LIANG;SENDA TAKAHIRO;KONO MASAYUKI;MATSUMOTO NAOKI
分类号 H01L21/3065;C23C16/52;H05H1/46 主分类号 H01L21/3065
代理机构 代理人
主权项
地址