SPATIAL LIGHT MODULATOR, EXPOSURE APPARATUS, AND PRODUCTION METHOD OF DEVICE

摘要

PROBLEM TO BE SOLVED: To reduce an error caused in a pattern even when an amount of light passing through gap regions between a plurality of optical elements of a spatial light modulator is large, in projecting the pattern by using the spatial light modulator.SOLUTION: A spatial light modulator 28 includes a plurality of mirror elements 30 each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase different from the first phase by 180°; and a boundary portion 34 arranged between the plurality of mirror elements 30, which changes the phase of the incident light by a third phase substantially different from the first phase by (90°+k×180°) (where k is an integer).