METHODS OF FORMING PATTERNS

摘要

PROBLEM TO BE SOLVED: To provide novel methods of forming patterned masks.SOLUTION: A first mask is formed over a material. The first mask has features extending therein and defines a first pattern. The first pattern has a first level of uniformity across a distribution of the features 16, 18. A brush layer is formed across the first mask and within the features to narrow the features and create a second mask from the first mask. The second mask has a second level of uniformity across the narrowed features which is greater than the first level of uniformity. A pattern is transferred from the second mask into the material.