发明名称 |
FILM STRUCTURE |
摘要 |
A film structure including a substrate, a coating layer, and an adhesive layer is provided. The coating layer and the adhesive layer are respectively disposed on two opposite surfaces of the substrate. The adhesive layer includes a chemical composition for filtering a light ray. The adhesive layer cuts off the light ray in a specific wavelength range when the light ray passes through the adhesive layer. A cut-off rate of the light ray in a wavelength range of 380 nm to 420 nm is greater than 80%. |
申请公布号 |
US2015234103(A1) |
申请公布日期 |
2015.08.20 |
申请号 |
US201414291018 |
申请日期 |
2014.05.30 |
申请人 |
Hsu Kuo-Teng;Lu Chih-Tsung;Hsiao Tse-Hung;Lin Yi-Chang;Chen Chia-Feng;Chung Lie-Zen |
发明人 |
Hsu Kuo-Teng;Lu Chih-Tsung;Hsiao Tse-Hung;Lin Yi-Chang;Chen Chia-Feng;Chung Lie-Zen |
分类号 |
G02B5/20;C09J11/06;C08K5/10;C09J133/08 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
1. A film structure, comprising:
a substrate; a coating layer; and an adhesive layer, wherein the coating layer and the adhesive layer are respectively disposed on two opposite surfaces of the substrate, and the adhesive layer comprises a light filtering compound, wherein when light passes through the film structure, a light ray in a specific wavelength range is cut off by the adhesive layer, and a cut-off rate of the adhesive layer with respect to a light ray in a wavelength range of 380 nm to 420 nm is greater than 80%. |
地址 |
Hsinchu TW |