发明名称 FILM STRUCTURE
摘要 A film structure including a substrate, a coating layer, and an adhesive layer is provided. The coating layer and the adhesive layer are respectively disposed on two opposite surfaces of the substrate. The adhesive layer includes a chemical composition for filtering a light ray. The adhesive layer cuts off the light ray in a specific wavelength range when the light ray passes through the adhesive layer. A cut-off rate of the light ray in a wavelength range of 380 nm to 420 nm is greater than 80%.
申请公布号 US2015234103(A1) 申请公布日期 2015.08.20
申请号 US201414291018 申请日期 2014.05.30
申请人 Hsu Kuo-Teng;Lu Chih-Tsung;Hsiao Tse-Hung;Lin Yi-Chang;Chen Chia-Feng;Chung Lie-Zen 发明人 Hsu Kuo-Teng;Lu Chih-Tsung;Hsiao Tse-Hung;Lin Yi-Chang;Chen Chia-Feng;Chung Lie-Zen
分类号 G02B5/20;C09J11/06;C08K5/10;C09J133/08 主分类号 G02B5/20
代理机构 代理人
主权项 1. A film structure, comprising: a substrate; a coating layer; and an adhesive layer, wherein the coating layer and the adhesive layer are respectively disposed on two opposite surfaces of the substrate, and the adhesive layer comprises a light filtering compound, wherein when light passes through the film structure, a light ray in a specific wavelength range is cut off by the adhesive layer, and a cut-off rate of the adhesive layer with respect to a light ray in a wavelength range of 380 nm to 420 nm is greater than 80%.
地址 Hsinchu TW