METHOD AND APPARATUS FOR CONDITIONING POLISHING PAD

摘要

A conditioning method which can efficiently produce surface roughness of a polishing pad to obtain an optimum polishing rate by performing dressing while monitoring the surface roughness of the polishing pad and adjusting a temperature of the polishing pad is disclosed. The conditioning method includes measuring surface roughness of the polishing pad during dressing of the polishing pad, comparing the measured surface roughness with preset target surface roughness to obtain comparison result, and adjusting a surface temperature of the polishing pad by heating or cooling the polishing pad based on the comparison result. The surface roughness is represented by at least one of five indexes comprising arithmetical mean deviation of the roughness profile (Ra), root mean square deviation of the roughness profile (Rq), maximum profile valley depth of the roughness profile (Rv), maximum profile peak height of the roughness profile (Rp), and maximum height of the roughness profile (Rz).

主权项

1. A conditioning method for adjusting surface roughness of a polishing pad by dressing the polishing pad on a polishing table configured to polish a substrate with a dresser pressed against the polishing pad, comprising:
measuring surface roughness of the polishing pad during dressing of the polishing pad, the surface roughness being represented by at least one of five indexes comprising arithmetical mean deviation of the roughness profile (Ra), root mean square deviation of the roughness profile (Rq), maximum profile valley depth of the roughness profile (Rv), maximum profile peak height of the roughness profile (Rp), and maximum height of the roughness profile (Rz); comparing the measured surface roughness with preset target surface roughness to obtain comparison result; and adjusting a surface temperature of the polishing pad by heating or cooling the polishing pad based on the comparison result.