CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD

摘要

A charged particle beam writing apparatus according to an embodiment of the present invention comprises: an emission unit to emit a charged particle beam; a stage on which a target specimen to be written is placed; an object lens to focus the charged particle beam on the specimen; a chamber in which the stage is disposed; a measurement unit to measure a partial pressure of prescribed gas in the chamber while the pressure in the chamber is controlled to be lower than an atmospheric pressure; and an adjustment unit to adjust a focus location for focusing the charged particle beam on the specimen according to the partial pressure of the prescribed gas.