发明名称 光応答性高分子が形成されてなる成形物およびその利用
摘要 PROBLEM TO BE SOLVED: To provide a photoresponsiveness polymer capable of forming fine pattern in three dimensions, without requiring mold.SOLUTION: In the photoresponsive polymer which is a polymer including a photoresponsive group for forming a bridged structure by receiving irradiation with light, the photoresponsive group in a proportion corresponding to a light ray amount of the light forms the bridged structure, and thereby, a volume of the amount corresponding to the light ray amount of the light is decreased. The photoresponsive group is desired to be a dimerization group which is mutually dimerized by receiving irradiation with the light. A cinnamoyl group, a coumarin group, a thymine group, a quinone group, a maleimide group, a chalcone group, and a uracil group, etc. are exemplified as the dimerization group.
申请公布号 JP5765729(B2) 申请公布日期 2015.08.19
申请号 JP20110002989 申请日期 2011.01.11
申请人 学校法人 関西大学 发明人 宮田 隆志;浦上 忠;小嶋 友里
分类号 C08F218/10;C08F290/06;C08J7/00;G03H1/02;G11B7/24035;G11B7/244 主分类号 C08F218/10
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