发明名称 成膜装置
摘要 <p>The present invention is to provide a technology for forming an organic compound film having a uniform thickness on a film at a high film formation speed while transporting the film in a vacuum chamber. In a vacuum chamber 2, a film 10 reeled out from a mother roll 41 is transported in contact with a center roller 3 and an organic compound film is formed on the film 10. A vapor emission device 8 disposed in a film deposition chamber 6 provided in the vacuum chamber 2 and having a vapor emission unit 82 which emits and blows a vapor of an organic compound monomer to a film 10 on the center roller 3; and an energy ray-emitting device 9 for irradiating an organic compound monomer layer formed on the center roller 3 with an energy ray so as to cure the organic compound layer are provided. The vapor emission device 8 and the film deposition chamber 6 are respectively connected to fifth and third vacuum evacuation devices 80 and 60 which are independently controllable; and the pressure in the vapor emission device 8 is set to be larger than the pressure in the film deposition chamber 6. The difference between the pressure in the vapor emission device 8 and the pressure in the film deposition chamber 6 is set to be constant.</p>
申请公布号 JP5764721(B2) 申请公布日期 2015.08.19
申请号 JP20140522529 申请日期 2013.06.12
申请人 株式会社アルバック 发明人 齋藤 和彦;飯島 正行;廣野 貴啓;中森 建治
分类号 C23C14/54;C23C14/12 主分类号 C23C14/54
代理机构 代理人
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