发明名称 半導体ウェーハの製造方法
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor wafer efficiently with no waste by measuring the resistivity in the state of ingot in order to provide a semiconductor wafer having a desired resistivity efficiently, and then manufacturing a semiconductor wafer based on the resistivity thus measured. <P>SOLUTION: In the method of manufacturing a semiconductor wafer from a single crystal ingot, resistivity distribution on the side surface of the single crystal ingot is measured in the direction of the growth axis. A desired resistivity position indicating a desired resistivity is then specified, and a block of a predetermined length is cut out and a semiconductor wafer is sliced therefrom. The resistivity in the direction of the growth axis can be measured by applying a resistivity measurement method based on the so-called 4 probe method. <P>COPYRIGHT: (C)2012,JPO&INPIT</p>
申请公布号 JP5767461(B2) 申请公布日期 2015.08.19
申请号 JP20100278314 申请日期 2010.12.14
申请人 发明人
分类号 H01L21/304;C30B15/20;C30B29/06 主分类号 H01L21/304
代理机构 代理人
主权项
地址