| 发明名称 |
Methods of forming photolithographic patterns |
| 摘要 |
<p>Provided are methods of forming photolithographic patterns using a negative tone development process. Also provided are coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.</p> |
| 申请公布号 |
EP2363749(B1) |
申请公布日期 |
2015.08.19 |
| 申请号 |
EP20110156745 |
申请日期 |
2011.03.03 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, LLC |
发明人 |
KANG, SEOKHO;CUTLER, CHARLOTTE |
| 分类号 |
G03F7/039;G03F7/20;G03F7/32 |
主分类号 |
G03F7/039 |
| 代理机构 |
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