| 摘要 |
<p>The disclosed radiation-sensitive resin composition has a repeating unit represented by general formula (1), has no or low alkaline solubility, and contains (A) a polymer that becomes alkaline-soluble when subjected to the action of an acid, and (B) a radiation-sensitive acid generator. (R1 is a hydrogen atom, a fluorine atom, a trifluoromethyl group or a C1-3 alkyl group, R20 is a C1-5 (na+2)-valent hydrocarbon, X is a single bond or at least one bivalent group selected from the group consisting of (a-1), (a-2), (a-3) and (a-4), na is an integer of 1-3, nb is an integer of 1-10, and na+nb = 1).</p> |
