发明名称 |
HIGH ASPECT RATIO STRUCTURE ANALYSIS |
摘要 |
Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion beam can mill at an angle to the work piece surface to create a sloped surface. A protective layer is deposited onto the sloped surface, and the ion beam mills through the protective layer to expose the feature of interest for analysis. The sloped mill positions the protective layer close to the feature of interest to reduce curtaining. |
申请公布号 |
EP2904382(A4) |
申请公布日期 |
2015.08.19 |
申请号 |
EP20130844339 |
申请日期 |
2013.10.04 |
申请人 |
FEI COMPANY |
发明人 |
LEE, SANG HOON;STONE, STACEY;BLACKWOOD, JEFFREY;SCHMIDT, MICHAEL |
分类号 |
G01N23/00;B23K15/08;G01B15/00;G01N1/32;H01J37/305;H01J37/317 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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