Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method

摘要

An EUV radiation generation apparatus includes a laser configured to generate pulses of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector and a radially positioned reflector. The rotatably mounted reflector and the laser are synchronized such that a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.

主权项

1. An EUV radiation generation apparatus comprising:
a laser configured to generate pulses of laser radiation; and an optical isolation apparatus comprising a rotatably mounted reflector rotatable about an optical axis of the EUV radiation generation apparatus or an axis substantially parallel to the optical axis between a first orientation and a second orientation, and a radially positioned reflector separated radially from the rotatably mounted reflector relative to the optical axis, the rotatably mounted reflector and the laser being synchronized such that when the rotatably mounted reflector is in the first orientation, a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material, and the rotatably mounted reflector and the laser being further synchronized such that when the rotatably mounted reflector is in the second orientation, the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.