发明名称 Epitaxial devices
摘要 Epitaxial growth methods and devices are described that include a textured surface on a substrate. Geometry of the textured surface provides a reduced lattice mismatch between an epitaxial material and the substrate. Devices formed by the methods described exhibit better interfacial adhesion and lower defect density than devices formed without texture. Silicon substrates are shown with gallium nitride epitaxial growth and devices such as LEDs are formed within the gallium nitride.
申请公布号 US9112104(B2) 申请公布日期 2015.08.18
申请号 US201414299742 申请日期 2014.06.09
申请人 Micron Technology, Inc. 发明人 deVilliers Anton;Byers Erik;Sills Scott E.
分类号 H01L21/02;H01L33/22;C30B29/40;C30B33/00;H01L21/308;H01L33/30;H01L33/00 主分类号 H01L21/02
代理机构 Schwegman Lundberg & Woessner, P.A. 代理人 Schwegman Lundberg & Woessner, P.A.
主权项 1. A light emitting diode, comprising: a silicon substrate; one or more angled surfaces formed on the silicon substrate; epitaxial gallium nitride formed on the one or more angled surfaces; and a P-N junction located in the epitaxial gallium nitride to provide light as electrons combine with holes across the P-N junction.
地址 Boise ID US