Lithographic apparatus comprising a substrate table and a surface substrate actuator

摘要

A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

主权项

1. A lithographic apparatus comprising:
a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a substrate surface actuator arranged to face a part of a surface of the substrate facing the projection system, the substrate surface actuator configured to exert a force on the part of the surface of the substrate, the substrate surface actuator comprising a Lorentz actuator, and a position controller configured to control a position of the substrate table, the position controller being operably connected to the positioner and the substrate surface actuator to drive the positioner and the substrate surface actuator, the substrate surface actuator being driven, in use, by said controller to reduce, with said exerted force, an inaccuracy of positioning of the substrate surface with respect to a plane of focus of the projection system, and wherein the actuator is arranged to engage at least part of a zone of the surface of the substrate that surrounds a downstream lens of the projection system, seen along a direction of an optical axis of the downstream lens of the projection system.