发明名称 |
Auto-focus system and methods for die-to-die inspection |
摘要 |
Disclosed are methods and apparatus for detecting defects in a semiconductor sample having a plurality of identically designed areas. An inspection tool is used to construct an initial focus trajectory for a first swath of the sample. The inspection tool is then used to scan the first swath by following the initial focus trajectory for the first swath while collecting autofocus data. A z offset measurement vector for each identically designed area in the first swath is generated based on the autofocus data. A corrected z offset vector is constructed for inspection of the first swath with the inspection tool. Constructing the corrected z offset vector is based on combining the z offset measurement vectors for two or more of the identically designed areas in the first swath so that the corrected z offset vector specifies a same z offset for each set of same positions in the two or more identically designed areas. |
申请公布号 |
US9110039(B2) |
申请公布日期 |
2015.08.18 |
申请号 |
US201414336875 |
申请日期 |
2014.07.21 |
申请人 |
KLA-Tencor Corporation |
发明人 |
Wright Michael J.;Lin Zhengcheng;Ghonsalves Wilfred L.;Belin Daniel L.;Sousa Weston L. |
分类号 |
G01N21/00;G01N21/956;G01N21/95 |
主分类号 |
G01N21/00 |
代理机构 |
Kwan & Olynick LLP |
代理人 |
Kwan & Olynick LLP |
主权项 |
1. A method for detecting defects in a semiconductor sample having a plurality of identically designed areas, the method comprising:
using an inspection tool to construct an initial focus trajectory for a first swath of the sample; using the inspection tool to scan the first swath by following the initial focus trajectory for the first swath while collecting autofocus data; generating a z offset measurement vector for each identically designed area in the first swath based on the autofocus data; and constructing a corrected z offset vector for inspection of the first swath with the inspection tool, wherein constructing the corrected z offset vector is based on combining the z offset measurement vectors for two or more of the identically designed areas in the first swath so that the corrected z offset vector specifies a same z offset for each set of same positions in the two or more identically designed areas. |
地址 |
Milpitas CA US |