发明名称 Immobilization of Technetium by Electroless Plating
摘要 A process of incorporating technetium into an electroless deposit, forming an alloy that is extremely resistant to corrosion and reduces the mobility of technetium on a geologic time scale is disclosed and claimed. The process includes providing a liquid containing technetium, such as an aqueous waste stream generated during the used nuclear fuel reprocessing activities. The technetium is collected and concentrated, and provided into an electroless deposition bath. A substrate, such as suitably prepared zero valent iron or stainless steel, is introduced into the bath to initiate autocatalytic electroless deposition of the technetium onto the substrate due to the difference in electrochemical potential between the plating bath and the metals in solution. This causes a layer of technetium metal to form on the substrate. The electroless deposition is continued until virtually all of the technetium has been removed from the bath, and then continues to build a layer of technetium-free material on the outermost surface of the substrate. One or more additional deposition steps may be performed to armor the plated substrate against leaching/corrosion in a nuclear waste disposal facility.
申请公布号 US9108867(B2) 申请公布日期 2015.08.18
申请号 US201313964247 申请日期 2013.08.12
申请人 AREVA Inc. 发明人 Hagerty Kevin J.
分类号 C23C18/54;C02F1/469;G21F9/06;G21F9/30;G21F9/34;C23C18/16;C23C18/50 主分类号 C23C18/54
代理机构 Sean P. O'Hanlon, Esq., PLLC 代理人 Sean P. O'Hanlon, Esq., PLLC
主权项 1. A process, comprising: providing a radioactive waste liquid generated during reprocessing of used nuclear fuel, said liquid containing 99Tc; adding chemicals to said liquid to form an electroless plating bath; introducing a plating substrate into said bath to initiate electroless deposition of said 99Tc onto said substrate; and maintaining said substrate within said bath until substantially all of said 99Tc is removed from said bath and deposited onto said substrate.
地址 Lynchburg VA US
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