Ion beam device and machining method

摘要

Provided are a device and method capable of machining a machining target such as a sample, a probe, or a sample table without requiring a high degree of device operation skill. First, a shape generation process of determining a shape of a machining target on the basis of an ion beam scanning signal and an absorption current of the machining target is performed. Next, a machining pattern positioning process of positioning a machining pattern over an image of the machining target is performed. Further, an ion beam stopping process of stopping ion beam irradiation is performed from a result of comparison between the image of the machining target and the machining pattern while the machining target is machined through the ion beam irradiation.

主权项

1. An ion beam device comprising:
an ion beam optical system configured to irradiate a machining target with an on beam; an absorption current detection device configured to detect an absorption current that flows through the machining target due to the ion beam irradiation; a central processing unit configured to control the ion beam optical system; a shape generation processing unit configured to obtain an image of the machining target on the basis of a scanning signal of the ion beam and the absorption current of the machining target; a machining pattern positioning processing unit configured to position a machining pattern over the image of the machining target obtained by the shape generation processing unit; and an ion beam stopping processing unit configured to stop the ion beam irradiation from a result of comparison between the image of the machining target and the machining pattern while the machining target is machined through the ion beam irradiation.