发明名称 Color filter and manufacturing method for the same
摘要 The present invention provides a color filter and a manufacturing method thereof. A transparent dyeable material is coated on a roller, and then imprint onto a patterned mold. A part of the transparent dyeable material is retained on the roller, and then imprinted onto a substrate by the roller and forms a black matrix (BM) layer through a dyeing process and a curing process in sequence. The other part of the transparent dyeable material is transferred onto the patterned mold for forming a plurality of softened color resist layers by the dyeing process, and then forms a plurality of color resist layers by a curing process after transferring the softened color resist layers onto the substrate having the BM layer.
申请公布号 US9110328(B2) 申请公布日期 2015.08.18
申请号 US201213641131 申请日期 2012.05.23
申请人 SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. LTD. 发明人 Chen Hsiao-hsien
分类号 G02F1/1335;G02B5/20;G02B5/23 主分类号 G02F1/1335
代理机构 代理人 Friedman Mark M.
主权项 1. A method for manufacturing a color filter, the method comprising steps of: providing a roller, and coating a transparent dyeable material onto the roller; providing a patterned mold, a surface of the patterned mold including a first pattern and a second pattern; and then rolling the roller along the surface of the patterned mold, the transparent dyeable material corresponding to the first pattern being adhered on the patterned mold, and the transparent dyeable material corresponding to the second pattern being remained on the roller; providing a substrate, and then pressing the roller onto the substrate as well as the roller being rolled along a surface of the substrate, so as to imprint the transparent dyeable material on the roller onto the substrate; and forming a matrix layer having the second pattern on the substrate, and then dyeing and curing the matrix layer to form a black matrix (BM) layer; dyeing the transparent dyeable material having the first pattern on the patterned mold to form a plurality of softened color resist layers, imprinting the softened color resist layers onto the substrate having the BM layer, and then curing the softened color resist layers imprinted on the substrate to form a plurality of color resist layers, the color resist layers comprising a first color resist layer, a second color resist layer and a third color resist layer; and forming a transparent conductive layer and spacers onto the substrate having the BM layer and the color resist layers.
地址 Shenzhen CN