发明名称 |
Thin film transistor array panel including layered line structure and method for manufacturing the same |
摘要 |
The present invention provides a thin film transistor array panel comprising an insulating substrate; a gate line formed on the insulating substrate; a gate insulating layer formed on the gate line; a drain electrode and a data line having a source electrode formed on the gate insulating layer, the drain electrode being adjacent to the source electrode with a gap therebetween; and a pixel electrode coupled to the drain electrode, wherein at least one of the gate line, the data line, and the drain electrode comprises a first conductive layer comprising a conductive oxide and a second conductive layer comprising copper (Cu). |
申请公布号 |
US9111802(B2) |
申请公布日期 |
2015.08.18 |
申请号 |
US201414165399 |
申请日期 |
2014.01.27 |
申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
Lee Je Hun;Bae Yang Ho;Cho Beom-Seok;Jeong Chang Oh |
分类号 |
H01L29/04;H01L27/12 |
主分类号 |
H01L29/04 |
代理机构 |
Innovation Counsel LLP |
代理人 |
Innovation Counsel LLP |
主权项 |
1. A thin film transistor array panel comprising:
an insulating substrate; a gate line disposed on the insulating substrate; a gate insulating layer which is in contact with the gate line; an oxide semiconductor which is in contact with the gate insulating layer; a drain electrode; and a data line having a source electrode disposed over the gate insulating layer, the drain electrode being adjacent to the source electrode and spaced apart therefrom; wherein at least one of the gate line, the data line, and the drain electrode comprises a first layer comprising a conductive oxide, a second layer comprising copper (Cu) and a third layer comprising a conductive oxide. |
地址 |
KR |