发明名称 Thin film transistor array panel including layered line structure and method for manufacturing the same
摘要 The present invention provides a thin film transistor array panel comprising an insulating substrate; a gate line formed on the insulating substrate; a gate insulating layer formed on the gate line; a drain electrode and a data line having a source electrode formed on the gate insulating layer, the drain electrode being adjacent to the source electrode with a gap therebetween; and a pixel electrode coupled to the drain electrode, wherein at least one of the gate line, the data line, and the drain electrode comprises a first conductive layer comprising a conductive oxide and a second conductive layer comprising copper (Cu).
申请公布号 US9111802(B2) 申请公布日期 2015.08.18
申请号 US201414165399 申请日期 2014.01.27
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 Lee Je Hun;Bae Yang Ho;Cho Beom-Seok;Jeong Chang Oh
分类号 H01L29/04;H01L27/12 主分类号 H01L29/04
代理机构 Innovation Counsel LLP 代理人 Innovation Counsel LLP
主权项 1. A thin film transistor array panel comprising: an insulating substrate; a gate line disposed on the insulating substrate; a gate insulating layer which is in contact with the gate line; an oxide semiconductor which is in contact with the gate insulating layer; a drain electrode; and a data line having a source electrode disposed over the gate insulating layer, the drain electrode being adjacent to the source electrode and spaced apart therefrom; wherein at least one of the gate line, the data line, and the drain electrode comprises a first layer comprising a conductive oxide, a second layer comprising copper (Cu) and a third layer comprising a conductive oxide.
地址 KR