发明名称 Apparatus and method for providing uniform flow of gas
摘要 Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectable with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.
申请公布号 US9109754(B2) 申请公布日期 2015.08.18
申请号 US201213653952 申请日期 2012.10.17
申请人 Applied Materials, Inc. 发明人 Yudovsky Joseph;Chang Mei;Gungor Faruk;Ma Paul F.;Chu David;Kao Chien-Teh;Lam Hyman;Wu Dien-Yeh
分类号 F16K11/20;F17D3/00 主分类号 F16K11/20
代理机构 Servilla Whitney LLC 代理人 Servilla Whitney LLC
主权项 1. A gas distribution apparatus for controlling flow of gas into a process chamber, comprising: a spiral delivery channel having an inlet end, an outlet end and a length, the delivery channel having a plurality of apertures spaced along the length; an inlet on the inlet end of the delivery channel, the inlet connectable to a gas source, wherein flow of the gas is controllable by a gas valve in communication with the inlet; and an outlet on the outlet end of the delivery channel, the outlet connectable to a vacuum source, wherein vacuum pressure through the outlet is controllable by an outlet valve to provide a reduced pressure at the outlet; and a controller to regulate the flow of the gas through the delivery channel and into the process chamber by opening and closing the outlet valve during gas delivery and gas purging in the channel to control the flow of gas through the apertures along the length of the channel.
地址 Santa Clara CA US