发明名称 Manufacturing method of solid-state imaging apparatus, solid-state imaging apparatus, and electronic imaging apparatus
摘要 A manufacturing method of a solid-state imaging apparatus includes the steps of: preparing a solid-state imaging device having a light receiving region at a main surface thereof; preparing a light transmitting member having an extending portion extending from the solid-state imaging device; preparing a holding member having a space for holding the solid-state imaging device therein, and having a positioning portion for positioning the solid-state imaging device; fixing the light transmitting member to the main surface of the solid-state imaging device in parallel to each other to keep a constant interval therebetween; bringing a side of the solid-state imaging device to meet the positioning portion of the holding member; and fixing the extending portion of the light transmitting member to the holding member.
申请公布号 US9111827(B2) 申请公布日期 2015.08.18
申请号 US201314142219 申请日期 2013.12.27
申请人 CANON KABUSHIKI KAISHA 发明人 Mochiduki Katsuhisa
分类号 H04N5/225;G02B26/02;H01L27/146 主分类号 H04N5/225
代理机构 Fitzpatrick, Cella, Harper & Scinto 代理人 Fitzpatrick, Cella, Harper & Scinto
主权项 1. A solid-state imaging apparatus, comprising: a solid-state imaging device including a light receiving region in a main face of the solid-state imaging device; a light transmitting member provided at a position apart from the light receiving region and including an extending portion which is at least a part of the light transmitting member and is extended from the solid-state imaging device; and a holding member for holding the light transmitting member and including a space where the solid-state imaging device is arranged, wherein a lower face of the extending portion of the light transmitting member is fixed to an upper face of a portion surrounding the space of the holding member, the portion surrounding the space of the holding member includes a positioning portion projected into the space, and a side of the solid-state imaging device is in contact with the positioning portion.
地址 Tokyo JP